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SQI: Simpson Querry Institute

Plasma Cleaner

Description and Applications

The High Power Expanded Plasma Cleaner from Harrick Plasma controls surface properties by removing residual nanoscale organic contamination and modifying surface chemistry. The PlasmaFlo accessory includes a vacuum gauge and a digital barometer and allows for quantitative control of the gas flow rate, process pressure monitoring, and gas mixing or independent control of two different gases. At ANTEC, the Plasma Cleaner is utilized for nanoscale surface cleaning and surface activation in preparation of biomaterials, scaffolds, and microfluidic devices. 



This table contains technical information about the Plasma Cleaner and what kind of analyses it can perform.
Power applied to RF coil Low Setting: 30W

Medium Setting: 38W

High Setting: 45W
Vacuum pressure range 1–1999 mTorr
Number of gas inputs 2


Acknowledging ANTEC

Please acknowledge the use of ANTEC equipment when data obtained in our core is published, used for proposal or grant submissions, or included in your presentations. Acknowledgement helps demonstrate ANTEC’s value to the Northwestern University Research community and contributes to our efforts to secure funding for new instruments and services. See sample text.